Determination of precise crystallographic directions on Si{111} wafers using self-aligning pre-etched pattern

Overview of attention for article published in Micro and Nano Systems Letters, June 2018

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So far, Dimensions has found 7 publications that cite this research output.

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Wet anisotropic etching characteristics of Si{111} in NaOH-based solution for silicon bulk micromachining

Article in Micro and Nano Systems Letters (December 2022)

Effect of IPA on Micromachining Characteristics of Silicon in KOH-Based Solution

Book chapter (November 2022)

A detailed study of industrially compatible, cost-effective and convenient texturization in large area diamond cut n-type C-Si

Article in Journal of Materials Science (September 2022)