Fabrication of Antireflective Sub-Wavelength Structures on Silicon Nitride Using Nano Cluster Mask for Solar Cell Application

Overview of attention for article published in Discover Nano, April 2009

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In the top 25% of all research outputs scored by Altmetric
Good Attention Score compared to outputs of the same age (71st percentile)
Good Attention Score compared to outputs of the same age and source (66th percentile)

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patent: 3 patents

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So far, Altmetric has seen 3 patents that reference this research output.

POLYCRYSTALLINE SILICON WATER WITH CONFIGURED MICROSTRUCTURES ON THEIR SURFACES FOR…

Application GR-20150100472-A

Greece

NOVEL DIELECTRIC NANO-STRUCTURE FOR LIGHT TRAPPING IN SOLAR CELLS

Application WO-2014205238-A1

World Intellectual Property Organisation (WIPO)

FABRICATION METHOD OF ANTI-REFLECTIVE NANOSTRUCTURE AND FABRICATION METHOD OF OPTICAL…

Application WO-2011021752-A1

World Intellectual Property Organisation (WIPO)