Title |
Nanoimprint lithography for nanodevice fabrication
|
---|---|
Published in |
Nano Convergence, September 2016
|
DOI | 10.1186/s40580-016-0081-y |
Pubmed ID | |
Authors |
Steven Barcelo, Zhiyong Li |
Abstract |
Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or even helium ion beam lithography. Furthermore, the use of mechanical deformation during the NIL process enables grayscale lithography with only a single patterning step, not achievable with any other conventional lithography techniques. These strengths enable the fabrication of unique nanoscale devices by NIL for a variety of applications including optics, plasmonics and even biotechnology. Recent advances in throughput and yield in NIL processes demonstrate the potential of being adopted for mainstream semiconductor device fabrication as well. |
Mendeley readers
Geographical breakdown
Country | Count | As % |
---|---|---|
United Kingdom | 1 | <1% |
Unknown | 140 | 99% |
Demographic breakdown
Readers by professional status | Count | As % |
---|---|---|
Student > Ph. D. Student | 20 | 14% |
Researcher | 18 | 13% |
Student > Master | 17 | 12% |
Student > Bachelor | 16 | 11% |
Other | 6 | 4% |
Other | 17 | 12% |
Unknown | 47 | 33% |
Readers by discipline | Count | As % |
---|---|---|
Engineering | 42 | 30% |
Chemistry | 12 | 9% |
Materials Science | 9 | 6% |
Biochemistry, Genetics and Molecular Biology | 7 | 5% |
Physics and Astronomy | 7 | 5% |
Other | 15 | 11% |
Unknown | 49 | 35% |