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Shape deviations in masks for optical structures produced by electron beam lithography

Overview of attention for article published in Microsystem Technologies, October 2004
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Mentioned by

patent
1 patent

Citations

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8 Dimensions

Readers on

mendeley
1 Mendeley
Title
Shape deviations in masks for optical structures produced by electron beam lithography
Published in
Microsystem Technologies, October 2004
DOI 10.1007/s00542-004-0386-3
Authors

A. Last, H. Hein, J. Mohr

Mendeley readers

Mendeley readers

The data shown below were compiled from readership statistics for 1 Mendeley reader of this research output. Click here to see the associated Mendeley record.

Geographical breakdown

Country Count As %
Russia 1 100%

Demographic breakdown

Readers by professional status Count As %
Student > Postgraduate 1 100%
Readers by discipline Count As %
Engineering 1 100%
Attention Score in Context

Attention Score in Context

This research output has an Altmetric Attention Score of 3. This is our high-level measure of the quality and quantity of online attention that it has received. This Attention Score, as well as the ranking and number of research outputs shown below, was calculated when the research output was last mentioned on 14 August 2012.
All research outputs
#8,534,528
of 25,373,627 outputs
Outputs from Microsystem Technologies
#138
of 596 outputs
Outputs of similar age
#24,473
of 75,445 outputs
Outputs of similar age from Microsystem Technologies
#2
of 10 outputs
Altmetric has tracked 25,373,627 research outputs across all sources so far. This one is in the 43rd percentile – i.e., 43% of other outputs scored the same or lower than it.
So far Altmetric has tracked 596 research outputs from this source. They receive a mean Attention Score of 3.7. This one is in the 11th percentile – i.e., 11% of its peers scored the same or lower than it.
Older research outputs will score higher simply because they've had more time to accumulate mentions. To account for age we can compare this Altmetric Attention Score to the 75,445 tracked outputs that were published within six weeks on either side of this one in any source. This one is in the 10th percentile – i.e., 10% of its contemporaries scored the same or lower than it.
We're also able to compare this research output to 10 others from the same source and published within six weeks on either side of this one. This one has scored higher than 8 of them.