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Effect of an increase in the nitrogen content of the working gas on the microstructure of reactive sputtered TiN thin films
Overview of attention for article published in Journal of Materials Science: Materials in Electronics, March 1992
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Antireflective coating
Grant US-8541860-B2
United States of America
24 Sep 2013
Antireflective coating
Grant US-7994600-B2
United States of America
09 Aug 2011