Photoresist-free lithography of 3μm wide UO3 lines from amorphous films of uranyl complexes

Overview of attention for article published in Journal of Materials Science, September 2004

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Method of making barrier layers

Grant US-7074640-B2

United States of America

Titanium carboxylate films for use in semiconductor processing

Grant US-7067346-B2

United States of America

Method for the deposition of materials from mesomorphous films

Application US-6777036-B2

United States of America