A transparent boron-nitrogen thin film formed by plasma CVD out of the discharge region

Overview of attention for article published in Plasma Chemistry and Plasma Processing, December 1984

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DEVICE FABRICATION BY X-RAY LITHOGRAPHY UTILIZING STABLE BORON NITRIDE MASK

Application EP-0289249-A3

European Patent Office

Device fabrication by X-ray lithography utilizing stable boron nitride mask

Application EP-0289249-A2

European Patent Office