Carbon-free SiOx films deposited from octamethylcyclotetrasiloxane (OMCTS) by an atmospheric pressure plasma jet (APPJ)

Overview of attention for article published in Journal de Physique II, February 2009

Altmetric Badge

About this Attention Score

In the top 25% of all research outputs scored by Altmetric
High Attention Score compared to outputs of the same age (87th percentile)
High Attention Score compared to outputs of the same age and source (85th percentile)

Mentioned by

patent: 3 patents

Citations

dimensions_citation: 33 Dimensions

Readers on

mendeley: 40 Mendeley

Summary Patents Dimensions citations

So far, Altmetric has seen 3 patents that reference this research output.

COMPOSITES INCLUDING SILICON-OXY-CARBIDE LAYERS AND METHODS OF MAKING THE SAME

Application EP-2844783-B1

European Patent Office

METHOD FOR INCREASING WIPE RESISTANCE AND SCRATCH RESISTANCE OF PLASTIC SURFACES

Application WO-2012143334-A1

World Intellectual Property Organisation (WIPO)

A process for increasing the smudge resistance or scratch resistance of plastics surfaces

Application DE-102011007557-A1

Germany