Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information

Overview of attention for article published in Journal of the American Society for Mass Spectrometry, May 2015

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So far, Altmetric has seen 2 patents that reference this research output.

Secondary ion mass spectroscopic method, mass spectrometer and uses thereof

Application US-10215719-B2

United States of America

SECONDARY IONS MASS SPECTROSCOPIC METHOD, MASS SPECTROMETER AND USES THEREOF

Application EP-3290913-A1

European Patent Office